| 摘要 |
The present invention relates to a method for manufacturing a silver nanostructure for a surface-enhanced-Raman-scattering substrate and a silver nano-structure thereby. According to the present invention, the method for manufacturing a silver nanostructure for a surface-enhanced-Raman-scattering substrate specifies a concentration of a reducing agent and silver nitrate, a reaction temperature, a stirring speed, one time loading level, a loading speed, and a total loading amount, and etc. which can not inferred by the conventional manufacturing method, so the average size of the manufactured silver nanostructure is uniform. A form of a particle can be manufactured with reproducibility as a multimer form which increases SERS signals by supplying a hot-spot which is a very strong electromagnetic field. Since the size of a particle is selectively controlled, a silver nanostructure for a surface-enhanced-Raman-scattering substrate can be mass-produced. [Reference numerals] (AA) Relative activity; (BB) Example 2-1~2-10; (CC) Example 1-1~1-10; (DD) Acceleration, 쨉L/s |
