发明名称 |
OBSERVATION WINDOW FOR HEAT TREATMENT CHAMBER OF SUBSTRATE, AND HEAT TREATMENT CHAMBER, APPARATUS AND METHOD OF SUBSTRATE HAVING THE SAME |
摘要 |
The present invention discloses an observation window for a thermal treatment chamber of a substrate, and a thermal treatment chamber, a device and a method including the same. The observation window for the thermal treatment chamber of the substrate includes at least one of first to third transparent windows provided at the first, second and rear sides of the thermal treatment chamber of the substrate. |
申请公布号 |
KR101370879(B1) |
申请公布日期 |
2014.03.07 |
申请号 |
KR20120150887 |
申请日期 |
2012.12.21 |
申请人 |
NARAENANOTECH CORPORATION |
发明人 |
SEO, JI HOON;AHN, KI YONG |
分类号 |
H01L21/02;H01L21/324 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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