| 摘要 |
PURPOSE: A thin film forming device and method are provided to obtain a dense thin film without voids by extending plasma particles to a substrate. CONSTITUTION: A thin film forming device comprises a chamber(10) injected with thin film forming gas, a transfer unit(20) transferring a substrate into the chamber, one or more sputtering sources(50) which is arranged above the substrate transferred into the chamber and includes a magnet array facing the substrate, and a magnetic(40) which is located under the substrate transferred into the chamber and extends plasma particles to the substrate when forming a thin film on the substrate. |
