摘要 |
PURPOSE: A metalizing device including a linear evaporating source is provided to minimized residues by compensating temperature differences generated in moving processes of vaporized material at a final step. CONSTITUTION: A metalizing device including a linear evaporating source comprises a source storing unit, a source supplying unit, and a linear evaporation source. A source is stored in the source storing unit. The source supplying unit supplies the source. The linear evaporation source vaporizes the source and metalizes the source to a substrate after converting the source into an evaporation source. |