发明名称 Deposition Apparatus Having Linear Evaporating Source
摘要 PURPOSE: A metalizing device including a linear evaporating source is provided to minimized residues by compensating temperature differences generated in moving processes of vaporized material at a final step. CONSTITUTION: A metalizing device including a linear evaporating source comprises a source storing unit, a source supplying unit, and a linear evaporation source. A source is stored in the source storing unit. The source supplying unit supplies the source. The linear evaporation source vaporizes the source and metalizes the source to a substrate after converting the source into an evaporation source.
申请公布号 KR101371596(B1) 申请公布日期 2014.03.07
申请号 KR20110106765 申请日期 2011.10.19
申请人 发明人
分类号 C23C14/26;H01L21/20 主分类号 C23C14/26
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