摘要 |
PURPOSE: A method for manufacturing a patent roll and the patent roll manufactured by the same are provided to obtain an accurate pattern by reducing the generation of minute branches in a printed pattern. CONSTITUTION: A base roll is prepared (S100). A pattern is formed on the base roll (S200). A protection layer is formed on the base roll (S300). A polishing pressure is applied to the base roll. The base roll is polished (S400). [Reference numerals] (S100) Step where a base roll is prepared; (S200) Step where a pattern is formed; (S300) Step where a protection layer is formed; (S400) Step where a polishing pressure is applied |