发明名称 |
PRE AND POST CLEANING OF MASK, WAFER, OPTICAL SURFACES FOR PREVENTION OF CONTAMINATION PRIOR TO AND AFTER INSPECTION |
摘要 |
A method and apparatus for preventing or minimizing contamination on a critical surface is disclosed. The method and apparatus for preventing or minimizing contamination on the critical surface may be an integrated component of an inspection system, and the cleaning process may be applied prior to the inspection process (may be referred to as pre-cleaning) which may greatly reduce photon-induced contamination. In addition, the cleaning process in accordance with the present disclosure may also be applied upon completion of the inspection process (may be referred to as post-cleaning). |
申请公布号 |
KR20140028020(A) |
申请公布日期 |
2014.03.07 |
申请号 |
KR20137030992 |
申请日期 |
2012.04.20 |
申请人 |
KLA-TENCOR CORPORATION |
发明人 |
DELGADO GILDARDO |
分类号 |
H01L21/302;G01N21/00;H01L21/66 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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