SPUTTERING TARGET

摘要

A sputtering target which contains a sintered body that contains a homologous structure compound represented by InAlO3(ZnO)m (wherein m is a number of 0.1-10) and containing an oxide that contains indium element (In), zinc element (Zn) and aluminum element (Al). The atomic ratio among the indium element, the zinc element and the aluminum element satisfies formulae (1)-(3). 0.10 <= In/(In + Zn + Al) <= 0.70 (1) 0.15 <= Zn/(In + Zn + Al) <= 0.65 (2) 0.01 <= Al/(In + Zn + Al) <= 0.45 (3)