ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition exhibiting excellent sensitivity, resolution and space width roughness in the formation of a fine isolated space pattern having a space width of 100 nm or less and exhibiting high resolution, good EL (exposure latitude) and excellent uniformity of local pattern dimension (Local-CDU) in the formation of a hole pattern with a fine hole diameter (for example, 50 nm or less), and to provide a resist film using the composition, a pattern forming method, a method for manufacturing an electronic device, and an electronic device.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition comprises a resin (A) having a repeating unit expressed by general formula (1-1) and a repeating unit expressed by general formula (1-2). The content of the repeating unit expressed by general formula (1-1) is 35 mol% or more with respect to all repeating units in the resin (A).