PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a pattern forming method, an actinic ray-sensitive or radiation-sensitive resin composition and a resist film, ensuring that in the formation of an ultrafine pattern (for example, a pattern with a line width or a space width in the order of several tens of nanometers), a line pattern with small line width roughness (LWR) can be formed with high resolution and high sensitivity, and that an isolated space pattern can be formed with high resolution, and to provide a method for manufacturing an electronic device using the above pattern forming method or the composition, and an electronic device.SOLUTION: The pattern forming method includes: a step (1) of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having a repeating unit expressed by general formula (I); a step (2) of exposing the film by using actinic rays or radiation; and a step (3) of forming a negative pattern by developing the film after exposure by using a developing solution containing an organic solvent. The content of the repeating unit expressed by general formula (I) is 25 mol% or more with respect to all repeating units in the resin (P).