发明名称 Precursors for Metal Organic Chemical Vapor Deposition Processes and Their Use
摘要 The present invention relates to a compound of the general formula (I) wherein R1 represents a group selected from the list consisting of methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, tert-butyl, linear or branched, saturated or mono- or polyunsaturated aliphatic carbon chain containing from two to ten carbon atoms, phenyl, and phenylacetylen, and wherein R2 and R3 independently of each other represent a group selected from the list consisting of Cl, I, methyl, phenyl, or phenylacetylene.
申请公布号 US2014065060(A1) 申请公布日期 2014.03.06
申请号 US201314013700 申请日期 2013.08.29
申请人 KARLSRUHER INSTITUT FUR TECHNOLOGIE (KIT);BASF SE 发明人 GERLINGER WOLFGANG;SACHWEH BERND;BRAESE STEFAN;ENDERS MIRJA;MUELLER THIERRY;KASPER GERHARD;SEIPENBUSCH MARTIN;GAO KUN;FAUST MATTHIAS;REICHENBACH LINUS
分类号 B01J23/42;C07F17/02 主分类号 B01J23/42
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