| 摘要 |
A semiconductor processing apparatus (1), comprising: a gas supply system (2), comprising at least one gas supply unit (100) including: a process gas source (110); a gas distribution manifold (150), including an annular gas distribution conduit (152) provided with an inlet (154) and a plurality of valved outlets (156a-c); a gas supply conduit (130, 132) fluidly connecting the process gas source (110) to the inlet (154) of the gas distribution manifold (150); a plurality of reactors (4a-c), each fluidly connected to a respective valved outlet (156a-c) of the gas distribution manifold (150), such that process gas from the process gas source (110) of the at least one gas supply unit (100) is selectively suppliable to a respective reactor of said plurality of reactors (4a-c) via the gas supply conduit (130, 132), the gas distribution manifold (150), and a respective valved outlet (156a-c). |
