| 摘要 |
The present invention provides a nanoimprint curable composition to be used in "nanoimprint lithography" in which a nanoimprint mold is pressed to transfer a fine concave-convex pattern, the nanoimprint curable composition containing a composite resin which has a polysiloxane segment and a polymer segment other than the polysiloxane segment, the polysiloxane segment containing a silanol group and/or hydrolyzable silyl group and having a polymerizable double bond. In addition, the present invention provides a nanoimprint-lithographic molded product, resist film, resin mold, and method for forming a pattern, which each involves use of the nanoimprint composition. |
