| 摘要 |
PURPOSE: An anti-shock etching apparatus for glass substrate is provided to reduce vibration and impact, on the glass substrate during etching process, by improving the shape of a feed wheel interlocked with a rail. CONSTITUTION: An anti-shock etching apparatus for glass substrate comprises a cassette(200), multiple supply tubes, and a transfer unit. The cassette contains a frame to mount the glass substrate. The multiples supply tubes are placed on the top of the glass substrate from the etching position, and etching solution spray nozzles(300) are arranged. The transfer unit transfers the cassette to a loading position from the etching position. The transfer unit includes a transfer device and a rail(500). The transfer device transfers the cassette. The rail connects the etching position with the loading position. The transfer device consists of a transfer body(400), feed wheels(410), and a transfer load(420). The depression part of the feed wheels is formed along the peripheral area, and the depression part of the feed wheels rotates while interlocked with the rail. |
