发明名称 Transistors, Semiconductor Devices, and Methods of Manufacture Thereof
摘要 Transistors, semiconductor devices and methods of manufacture thereof are disclosed. In one embodiment, a method of manufacturing a semiconductor device includes forming a transistor over a workpiece. The transistor includes a sacrificial gate material comprising a group III-V material. The method includes combining a metal (Me) with the group III-V material of the sacrificial gate material to form a gate of the transistor comprising a Me-III-V compound material.
申请公布号 US2014061722(A1) 申请公布日期 2014.03.06
申请号 US201213604510 申请日期 2012.09.05
申请人 DOORNBOS GERBEN;OXLAND RICHARD;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 DOORNBOS GERBEN;OXLAND RICHARD
分类号 H01L29/812;H01L21/338 主分类号 H01L29/812
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