RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a resist composition capable of producing a resist pattern excellent in CD uniformity (CDU).SOLUTION: The resin composition contains: (A1) a resin which contains a structural unit represented by formula (I) and a structural unit represented by formula (a4) and has no acid-labile group; (A2) a resin having an acid-labile group; and an acid generator. [In the formulae, Rrepresents a hydrogen atom or a methyl group; Rrepresents a C3-C18 alicyclic hydrocarbon group; Lrepresents a C1-C18 divalent saturated hydrocarbon group or a single bond; Rrepresents a hydrogen atom or a methyl group; and Rrepresents a C1-C24 saturated hydrocarbon group having a fluorine atom.]