METHOD AND APPARATUS FOR PROCESSING SUBSTRATE, AND CERAMIC COMPOSITION FOR THEM

摘要

PROBLEM TO BE SOLVED: To provide a ceramic composition having high corrosion resistance and never causing pollution for a dielectric window of a reactor chamber where a substrate is processed in plasma of a processing gas, and for a processing kit; and to provide a method for processing (e.g., etching) the substrate in a chamber containing the plasma of the processing gas.SOLUTION: A ceramic composition comprises a ceramic compound (e.g., AlO) and an oxide of a Group 3B metal (e.g., YO). This method comprises sending processing power through a dielectric window formed of the ceramic composition.