发明名称 METHOD FOR PRETREATING SUBSTRATES FOR PVD METHODS
摘要 The invention relates to a method for coating work pieces in a vacuum treatment system having a first electrode embodied as a target, which is part of an arc vaporization source. Using the first electrode, an arc is operated with an arc current and vaporizes material. A bias voltage is applied to a bias electrode, which includes a second electrode that is embodied as a work piece holder, together with the work pieces. Metal ion bombardment is carried out either to pretreat the work pieces or in at least one transition from one layer to an adjacent layer of a multilayer system, so that neither a significant material removal nor a significant material buildup occurs, but instead, introduces metal ions into a substrate surface or into a layer of a multilayer system.
申请公布号 US2014061034(A1) 申请公布日期 2014.03.06
申请号 US201314075085 申请日期 2013.11.08
申请人 OERLIKON TRADING AG, TRUEBBACH 发明人 RUDIGIER HELMUT;RAMM JUERGEN;WIDRIG BENO;VOM BRAUCKE TROY
分类号 C23C14/32 主分类号 C23C14/32
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