发明名称 COMPOSITE CHARGED PARTICLE BEAM APPARATUS AND THIN SAMPLE PROCESSING METHOD
摘要 A composite charged particle beam apparatus includes: a FIB column irradiating a thin sample with FIB; a GIB column irradiating the thin sample with GIB; a sample stage on which the thin sample is placed; a first tilt unit for tilting the thin sample about a first tilt axis of the sample stage, the first tilt axis being orthogonal to an FIB irradiation axis and being located inside a first plane formed by the FIB irradiation axis and a GIB irradiation axis; and a second tilt unit for tilting the thin sample about an axis which is orthogonal to the FIB irradiation axis and the first tilt axis.
申请公布号 US2014061159(A1) 申请公布日期 2014.03.06
申请号 US201314012019 申请日期 2013.08.28
申请人 HITACHI HIGH-TECH SCIENCE CORPORATION 发明人 ASAHATA TATSUYA;SUZUKI HIDEKAZU;TORIKAWA SHOTA
分类号 H01J37/30;H01J37/02 主分类号 H01J37/30
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