| 摘要 |
PURPOSE: A plasma processing device is provided to effectively process materials by obtaining time for generating reaction in plasma discharge space. CONSTITUTION: A reactor (30) discharges materials through an outlet (44) by receiving the materials through an inlet (42). A first and a second electrode unit (52, 54) are individually installed according to the processing channel of a tornado shape from the inlet to the outlet in the reactor. The first and the second electrode unit supplies the high voltage of a predetermined period for generating plasma discharge reaction in a processing channel in which a process target material and process gas are inserted. |
