| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas distribution system for supplying different gas compositions to a chamber, such as a plasma processing chamber of a plasma processing apparatus.SOLUTION: A gas distribution system can continuously supply first and second gases to a switching section, and the switching section is operable to switch flows of the first and second gases, such that one of the first and second process gases is supplied to a chamber while the other of the first and second gases is supplied to a by-pass line, and then to switch the gas flows. The switching section preferably includes fast switching valves operable to quickly open and close to allow fast switching of the first and second gases, preferably without occurrence of undesirable pressure surges or flow instabilities in the flow of either gas. |
