发明名称 SUBSTRATE SUPPORT DEVICE AND EXPOSURE DEVICE
摘要 <p>Provided are: a substrate base provided with a surface for supporting, in a flat state or a curved state having a prescribed curve, a flexible and transmissive substrate to be optically treated; and a film formed on the surface of the substrate base and having a reflectance of 50% or less in relation to the light (ultraviolet rays for exposure, visible light for alignment, etc.) used in the optical treatment.</p>
申请公布号 WO2014034161(A1) 申请公布日期 2014.03.06
申请号 WO2013JP57062 申请日期 2013.03.13
申请人 NIKON CORPORATION 发明人 KATO MASAKI;KITO YOSHIAKI;HORI MASAKAZU;KIUCHI TOHRU
分类号 G03F9/00;G03F7/24;H01L21/027 主分类号 G03F9/00
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