发明名称 Electroless metal deposition for micron scale structures
摘要 <p>A method for electroless metal deposition on a surface in a finely dimensioned space (e.g. the bore of a hollow fibre) comprises introducing into said space an electroless plating solution that has a nil or relatively low plating rate at normal room temperature, and there after heating said structure to an elevated temperature for a period sufficient to cause metal to plate on the wall surface. The steps of introducing and heating may be repeated as necessary to build up a required thickness.</p>
申请公布号 AU2010217389(B2) 申请公布日期 2014.03.06
申请号 AU20100217389 申请日期 2010.02.25
申请人 BAE SYSTEMS PLC 发明人 DUNLEAVY, MICHAEL;HAQ, SAJAD;HUCKER, MARTYN JOHN
分类号 C23C18/16;B29C70/06;C23C18/44 主分类号 C23C18/16
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