发明名称 LIGHT IRRADIATION APPARATUS AND METHOD
摘要 PROBLEM TO BE SOLVED: To provide a light irradiation apparatus and method, capable of preventing degradation of light emission sources in an early stage by allowing a light volume of a plurality of the light emission sources to be different from each other.SOLUTION: A light irradiation apparatus 10 makes an ultraviolet ray irradiate an adhesive sheet S of ultraviolet ray setting type which is pasted on a semiconductor wafer W. The light irradiation apparatus 10 includes a light emitting means 12 which is arranged relatively to a table 11 and contains a plurality of light emitting diodes 20, a driving means 15 to rotate the table 11 and the light emitting means 12 relatively to each other, and an inverting means 16 which replaces one end A side with the other end B side of the light emitting means 12 each other to a rotational center C side of relative rotation. The light emitting diodes 20 positioned on the rotational center C side are set lower in light volume than the light emitting diodes 20 positioned outside to prevent early degradation, and the one end A side and the other end B side are replaced with each other by the inverting means 16 each time a predetermined time period passes.
申请公布号 JP2014042076(A) 申请公布日期 2014.03.06
申请号 JP20130240763 申请日期 2013.11.21
申请人 LINTEC CORP 发明人 SUGISHITA YOSHIAKI
分类号 H01L21/683 主分类号 H01L21/683
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