发明名称 LEAKAGE MEASUREMENT OF THROUGH SILICON VIAS
摘要 A method of testing a semiconductor substrate having through substrate vias for current leakage which includes: forming a current leakage measurement structure that includes substrate contacts, sensing circuits to sense current leakage from the through substrate vias, the sensing circuits connected to the through substrate vias and to the substrate contacts so that there is a one-to-one correspondence of a substrate contact and sensing circuit to each through substrate via, and a built-in self test (BIST) engine to sense one of the through substrate vias for current leakage. A reference current is applied to the sensing circuits to set a current leakage threshold for the through substrate vias. A through substrate via is selected for sensing for current leakage. The sensing circuit senses the selected through substrate via to determine whether there is current leakage from the selected through substrate via.
申请公布号 US2014065738(A1) 申请公布日期 2014.03.06
申请号 US201314079203 申请日期 2013.11.13
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BHOOVARAGHAN BHAVANA;FAROOQ MUKTA G.;KINSER EMILY R.;SAROOP SUDESH
分类号 H01L21/66 主分类号 H01L21/66
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