发明名称 RETAINER RING STRUCTURE FOR CHEMICAL-MECHANICAL POLISHING AND METHOD FOR MANUFACTURING SAME
摘要 <p>The present invention relates to a method for manufacturing a retainer ring structure for chemical-mechanical polishing (CMP), which uses a high-strength metal material for screw areas, which fix the retainer ring structure that is coupled to a polishing head during a CMP process, and simplifies the method for manufacturing the retainer ring structure, thereby reducing product defect rates by increasing coupling force with the polishing head, reducing working time and unit cost by simplifying the process, and thus effectively increasing salability.</p>
申请公布号 WO2014035044(A1) 申请公布日期 2014.03.06
申请号 WO2013KR06115 申请日期 2013.07.10
申请人 CNUS CO., LTD. 发明人 KIM, BU SOON;CHOI, HEUNG SUN
分类号 H01L21/304 主分类号 H01L21/304
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