发明名称 |
THIN FILM FABRICATION METHOD BY ELECTROMAGNETIC WAVE ASSISTED SOL-GEL, AND THIN FILM MADE BY THE SAME |
摘要 |
The present invention relates to a thin film fabrication method by an electromagnetic wave assisted sol-gel method, and a thin film made by the same. More particularly, in a thin film fabrication method by an electromagnetic wave assisted sol-gel method, the present invention relates to a thin film fabrication method by an electromagnetic wave assisted sol-gel method for forming a thin film by spraying sol while irradiating the surface of a substrate with electromagnetic waves in order to apply energy. A thin film made by an electromagnetic wave assisted sol-gel method has improved density, light transmittance, surface resistance, and surface roughness because the crystallinity is improved and has excellent structural and optical properties because the residual stress is reduced. [Reference numerals] (AA) Comparative example; (BB) Example 1; (CC) Example 2; (DD) Example 3; (EE) Example 4; (FF) Comparative example annealed at 600°C; (GG) Comparative example annealed at 700°C |
申请公布号 |
KR20140026897(A) |
申请公布日期 |
2014.03.06 |
申请号 |
KR20120092649 |
申请日期 |
2012.08.23 |
申请人 |
INJE UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION |
发明人 |
LEEM, JAE YOUNG;KIM, MIN SU;KIM, SOARAM;NAM, GI WOONG;PARK, HYUNG GIL;YOON, HYUN SIK |
分类号 |
H01B13/00;H01B5/14 |
主分类号 |
H01B13/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|