发明名称
摘要 An ultra-hard semiconductive polycrystalline diamond (PCD) material formed with semiconductive diamond particles doped with Li, Be or Al and/or insulative diamond particles having semiconductive surfaces, tools incorporating the same, and methods for forming the same, are provided. The ultra-hard PCD material may be formed using a layer of insulative diamond grit feedstock that includes additives therein, then sintering to convert a plurality of the diamond crystals to include a semiconductive surface. In another embodiment, the ultra-hard PCD material is formed by sintering semiconductive diamond grit feedstock consisting of diamond crystals doped with Li, Al or Be. The ultra-hard semiconductive PCD cutting layer exhibits increased cuttability, especially in EDM and EDG cutting operations. <IMAGE>
申请公布号 JP5432084(B2) 申请公布日期 2014.03.05
申请号 JP20100183926 申请日期 2010.08.19
申请人 发明人
分类号 B23B51/00;B23P15/28;B22F3/10;B22F7/06;B23B27/14;B23B27/20;B23P15/32;C04B35/52;C23C24/08;C23C30/00 主分类号 B23B51/00
代理机构 代理人
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