发明名称
摘要 <P>PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition that suppresses occurrence of development defects and has excellent exposure latitude and line edge roughness performance. <P>SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition contains (A) a compound generating an acid by irradiation with actinic rays or radiation, (B) a resin showing an increase in dissolution rate with an alkali developing solution by an action of an acid, and (C) a hydrophobic resin. The compound (A) generating an acid by irradiation with actinic rays or radiation is represented by general formula (1). <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP5433251(B2) 申请公布日期 2014.03.05
申请号 JP20090033284 申请日期 2009.02.16
申请人 发明人
分类号 G03F7/039;C08F220/26;G03F7/004;H01L21/027 主分类号 G03F7/039
代理机构 代理人
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