| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum vapor deposition apparatus and a method capable of enhancing the continuous vapor deposition capacity, with respect to a vacuum vapor deposition apparatus using an electron beam evaporation source. SOLUTION: The vacuum vapor deposition apparatus with an electron beam evaporation source mounted thereon comprises a deposition-preventive cover to cover a predetermined member in the apparatus, and a drive source for moving the deposition-preventive cover. A plurality of deposition-preventive covers are used, and one of the plurality of deposition-preventive covers is arranged at the position facing the evaporation source, and the deposition-preventive cover arranged at the position facing the vapor deposition source is exchanged by a drive source. COPYRIGHT: (C)2007,JPO&INPIT |
