发明名称 |
PATTERN FORMING METHOD AND ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION |
摘要 |
Provided is a method of forming a pattern and an actinic-ray- or radiation-sensitive resin composition that excels in the limiting resolving power, roughness characteristics, exposure latitude (EL) and bridge defect performance. The method of forming a pattern includes (1) forming an actinic-ray- or radiation-sensitive resin composition into a film, (2) exposing the film to light, and (3) developing the exposed film with a developer containing an organic solvent. The actinic-ray- or radiation-sensitive resin composition contains (A) a resin containing a repeating unit with a structural moiety that is configured to decompose when exposed to actinic rays or radiation to thereby generate an acid, and (B) a solvent. |
申请公布号 |
EP2577397(A4) |
申请公布日期 |
2014.03.05 |
申请号 |
EP20110786732 |
申请日期 |
2011.05.20 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
IWATO, KAORU;TAKAHASHI, HIDENORI;HIRANO, SHUJI;KAMIMURA, SOU;KATO, KEITA |
分类号 |
G03F7/004;G03F7/038;G03F7/039;G03F7/32 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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