| 摘要 |
In the present invention, an apparatus for processing a substrate includes a chamber which has a process space and an environment space; a process container which has an open upper part and is arranged in the process space; a substrate support member which includes a spin head located in the substrate and is arranged in the process chamber; a nozzle unit which moves an arm and is arranged in the outside environment space of the process container in the chamber, a nozzle supplying a process fluid to the substrate, and an arm supporting the nozzle; a partition member which has an opening part passing through the arm and divides the process space and the environment space. When the arm is located in the environment space, one side of the arm can block the opening part. |
