发明名称 METHOD OF MANUFACUTRUING SEMICONDUCTOR DEVICE STRUCTURE
摘要 <p>Disclosed is a method for manufacturing a semiconductor device structure comprising the steps of: fixing the positions of two semiconductor devices on top of a plate, wherein the positions of each electrode of two semiconductor devices are fixed to face the plate; covering the semiconductor devices with an encapsulation material; separating the semiconductor devices covered with the encapsulation material from the plate; forming a groove in the encapsulation material between the semiconductor devices with a remover for the encapsulation material; and separating two semiconductor devices by cutting the encapsulation material in which the groove is formed.</p>
申请公布号 KR20140026167(A) 申请公布日期 2014.03.05
申请号 KR20120093214 申请日期 2012.08.24
申请人 CTLAB CO., LTD. 发明人 KIM, CHANG TAE;KO, JAE SUNG
分类号 H01L33/52;H01L33/48 主分类号 H01L33/52
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