发明名称 GAS SYSTEM FOR REACTIVE DEPOSITION PROCESS
摘要 A gas lance unit configured for a reactive deposition process with a plurality of spaced apart crucibles, wherein spaces are provided between the crucibles, is described. The gas lance unit includes a gas guiding tube having one or more outlets for providing a gas for the reactive deposition process, and a condensate guiding element for guiding a condensate, particularly an aluminum condensate, to one or more positions above the spaces.
申请公布号 EP2702184(A1) 申请公布日期 2014.03.05
申请号 EP20110716931 申请日期 2011.04.29
申请人 APPLIED MATERIALS, INC. 发明人 HOFFMANN, GERD;WOLFF, ALEXANDER
分类号 C23C14/00;C23C14/56 主分类号 C23C14/00
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