发明名称 STRAIN GAUGE, AND SYSTEM FOR SPATIALLY LOCATING SUCH GAUGES
摘要 <p>A strain gauge includes a substrate (2) for mounting an element (3) to be reversibly lengthened by a force applied while displaying a variation in the resistance thereof, the element (3) lengthening itself along an axis for measurement by the gauge. The gauge includes at least one contrast target (5, 6) capable of reflecting an incident light beam, the at least one contrast target (5, 6) being placed on the gauge in a predetermined position that makes it possible to predetermine the center of the axis (4), for measurement by the strain gauge (1), by detecting the position of the at least one contrast target (5, 6).</p>
申请公布号 EP2467671(B1) 申请公布日期 2014.03.05
申请号 EP20100761054 申请日期 2010.08.12
申请人 EUROPEAN AERONAUTIC DEFENCE AND SPACE COMPANY EADS FRANCE 发明人 SWIERGIEL, NICOLAS;BOSQUET, CATHERINE;DIDIERJEAN, SEBASTIEN
分类号 G01M5/00;G01B7/16;G01B11/02;G01B11/16;G01L1/22;G01S17/06;G01S17/46 主分类号 G01M5/00
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