发明名称 FILM LAYER ETCHING METHOD AND LASER LITHOGRAPHIC MACHINE THEREOF
摘要 The invention provides a film etching method and a laser photoetching machine, in particular to a surface protecting layer treatment method applied to a large-size touch panel and adopting laser etching. According to the invention, the film etching method comprises the following steps: forming a film on a substrate; and ablating a predetermined region of the film by utilizing a laser beam so as to form a patterning film. The laser photoetching machine comprises a laser, a focus lens group, a controller, a drive motor and a locating platform, wherein the laser beam is emitted by the laser, and the laser beam is projected on the surface of a work piece on the locating platform through the focus lens group. According to the invention, by adopting a method for directly etching on the surface of the film by the laser to form the required pattern, the film etching method and the laser photoetching machine can be used for processing the large-size touch panel without a light cover, a screen printing process or a multi-step photoetching process provided with the light cover can be replaced by a rapid single-step patterning process, and production cost is reduced.
申请公布号 KR101370583(B1) 申请公布日期 2014.03.05
申请号 KR20120022197 申请日期 2012.03.05
申请人 发明人
分类号 G06F3/041;B23K26/362 主分类号 G06F3/041
代理机构 代理人
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