发明名称
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a high-purity and high-density metal boride sintered compact suitable as a constituent material of a sputtering target, and a lanthanum boride sintered compact having the above properties. <P>SOLUTION: The method for manufacturing a metal boride sintered compact includes a step (a) for heating a metal boride powder contaminated with at least one kind of impurity selected from a metal carbide, metal oxide, metal-boron compound oxide, boron carbide and boron oxide, at a temperature of 600-800&deg;C in the atmosphere to oxidize the impurities; a step (b) for removing the impurities by treating the heated metal boride powder obtained in the step (a) in an inorganic acid and thus eluting the oxidized impurities; and a step (c) for pressure-sintering the metal boride powder obtained in the step (b). The lanthanum boride sintered compact contains LaB<SB>6</SB>as the main component and 0.3 volume% or less of impurities except LaB<SB>6</SB>that are composed of at least two or more elements among La, C, O and B, and has a relative density of the sintered compact of 88% or higher. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP5434583(B2) 申请公布日期 2014.03.05
申请号 JP20090298454 申请日期 2009.12.28
申请人 发明人
分类号 C04B35/58;C23C14/34 主分类号 C04B35/58
代理机构 代理人
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