发明名称 |
Field effect transistor with narrow bandgap source and drain regions and method of fabrication |
摘要 |
A transistor having a narrow bandgap semiconductor source/drain region is described. The transistor includes a gate electrode formed on a gate dielectric layer formed on a silicon layer. A pair of source/drain regions are formed on opposite sides of the gate electrode wherein said pair of source/drain regions comprise a narrow bandgap semiconductor film formed in the silicon layer on opposite sides of the gate electrode. |
申请公布号 |
US8664694(B2) |
申请公布日期 |
2014.03.04 |
申请号 |
US201313752272 |
申请日期 |
2013.01.28 |
申请人 |
CHAU ROBERT S.;DATTA SUMAN;KAVALIEROS JACK;BRASK JUSTIN K.;DOCZY MARK L.;METZ MATTHEW;INTEL CORPORATION |
发明人 |
CHAU ROBERT S.;DATTA SUMAN;KAVALIEROS JACK;BRASK JUSTIN K.;DOCZY MARK L.;METZ MATTHEW |
分类号 |
H01L29/66 |
主分类号 |
H01L29/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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