发明名称 Pulsed laser micro-deposition pattern formation
摘要 A method of forming patterns on transparent substrates using a pulsed laser is disclosed. Various embodiments include an ultrashort pulsed laser, a substrate that is transparent to the laser wavelength, and a target plate. The laser beam is guided through the transparent substrate and focused on the target surface. The target material is ablated by the laser and is deposited on the opposite substrate surface. A pattern, for example a gray scale image, is formed by scanning the laser beam relative to the target. Variations of the laser beam scan speed and scan line density control the material deposition and change the optical properties of the deposited patterns, creating a visual effect of gray scale. In some embodiments patterns may be formed on a portion of a microelectronic device during a fabrication process. In some embodiments high repetition rate picoseconds and nanosecond sources are configured to produce the patterns.
申请公布号 US8663754(B2) 申请公布日期 2014.03.04
申请号 US20090400438 申请日期 2009.03.09
申请人 LIU BING;HU ZHENDONG;MURAKAMI MAKOTO;XU JINGZHOU;CHE YONG;IMRA AMERICA, INC. 发明人 LIU BING;HU ZHENDONG;MURAKAMI MAKOTO;XU JINGZHOU;CHE YONG
分类号 C23C14/28;B05D5/06;B05D5/12;B23K26/00;C08J7/04 主分类号 C23C14/28
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