发明名称 |
Photomask blank, method of manufacturing the same, photomask, and method of manufacturing the same |
摘要 |
A photomask blank for use in the manufacture of a photomask adapted to be applied with exposure light having a wavelength of 200 nm or less has a thin film on a transparent substrate. The thin film is made of a material containing a transition metal, silicon, and carbon and comprising silicon carbide and/or a transition metal carbide. |
申请公布号 |
US8663876(B2) |
申请公布日期 |
2014.03.04 |
申请号 |
US201013201368 |
申请日期 |
2010.02.04 |
申请人 |
HASHIMOTO MASAHIRO;SUZUKI TOSHIYUKI;IWASHITA HIROYUKI;HOYA CORPORATION |
发明人 |
HASHIMOTO MASAHIRO;SUZUKI TOSHIYUKI;IWASHITA HIROYUKI |
分类号 |
C23C16/34;C23C14/06;G03F1/22;G03F1/50;G03F1/54 |
主分类号 |
C23C16/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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