发明名称 |
Microlithographic projection illumination system, and method for producing microstructured components |
摘要 |
The method involves depicting the sample of a structure in an image plane of a projection objective. The sample is effected by the application rate distribution of projection light in the image plane, such that the image of the structure is independent of the topography of the structure. The structure is provided within the region surrounding the structure. The regions for the structures exhibit a prescribed form and dimension. |
申请公布号 |
KR101369132(B1) |
申请公布日期 |
2014.03.04 |
申请号 |
KR20087010757 |
申请日期 |
2006.11.08 |
申请人 |
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发明人 |
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分类号 |
G02B27/00;G02B27/18;G03F7/20;H01L21/027 |
主分类号 |
G02B27/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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