发明名称 Microlithographic projection illumination system, and method for producing microstructured components
摘要 The method involves depicting the sample of a structure in an image plane of a projection objective. The sample is effected by the application rate distribution of projection light in the image plane, such that the image of the structure is independent of the topography of the structure. The structure is provided within the region surrounding the structure. The regions for the structures exhibit a prescribed form and dimension.
申请公布号 KR101369132(B1) 申请公布日期 2014.03.04
申请号 KR20087010757 申请日期 2006.11.08
申请人 发明人
分类号 G02B27/00;G02B27/18;G03F7/20;H01L21/027 主分类号 G02B27/00
代理机构 代理人
主权项
地址