发明名称 Graphene substituted with boron and nitrogen, method of fabricating the same, and transistor having the same
摘要 Graphene, a method of fabricating the same, and a transistor having the graphene are provided, the graphene includes a structure of carbon (C) atoms partially substituted with boron (B) atoms and nitrogen (N) atoms. The graphene has a band gap. The graphene substituted with boron and nitrogen may be used as a channel of a field effect transistor. The graphene may be formed by performing chemical vapor deposition (CVD) method using borazine or ammonia borane as a boron nitride (B-N) precursor.
申请公布号 US8664439(B2) 申请公布日期 2014.03.04
申请号 US201113064896 申请日期 2011.04.25
申请人 LEE SUNG-HOON;SEO SUN-AE;WOO YUN-SUNG;CHUNG HYUN-JONG;HEO JIN-SEONG;SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE SUNG-HOON;SEO SUN-AE;WOO YUN-SUNG;CHUNG HYUN-JONG;HEO JIN-SEONG
分类号 C07F5/02 主分类号 C07F5/02
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