| 摘要 |
<p>An oxygenated reactant and a metal or metalloid vapour are fed to a reactor, one gas stream being periodically pulsed at a higher pressure, to remove deposits from the reactor walls. The pulsed gas may be a reaction component or an added gas. This method prevents the build-up normally found on walls of reactors preparing finely divided powders (e.g. as in USP 3275412) and therefore allows more continuous operation at higher through-put and it improves product quality.</p> |
