VACUUM FILM FORMATION DEVICE

摘要

Provided is a vacuum coating apparatus that deposits a coating on a substrate, the vacuum coating apparatus including: a vacuum chamber; a vacuum exhaust unit that performs a vacuum exhaust operation inside the vacuum chamber; a plurality of rotation holding units that hold the substrate as a coating subject in a rotating state; and a revolution mechanism that revolves the plurality of rotation holding units about a revolution axis parallel to the rotation axes of the respective rotation holding units; in which the plurality of rotation holding units are divided into a plurality of groups so that power is supplied to the respective rotation holding units in a manner that the rotation holding units of the respective groups have different potentials. For example, the respective groups alternately repeat a state where the rotation holding units become cathodes and serve as working electrodes that play primary role to generate glow discharge plasma and a state where the rotation holding units serve as counter electrodes.