发明名称 |
COMPOSITION FOR REMOVING PHOTORESIST |
摘要 |
The present invention relates to a stripping liquid composition for removing photoresist, capable of replacing solvents such as NMP which is hazardous to human body, and which is excellent in stripping, thereby including N,N-dimethyl propionamide. The stripping liquid composition for removing photoresist includes: 10-85 % by weight of N,N-dimethyl propionamide, 1-30 % by weight of cyclic amines, 10-85 % by weight of amphiprotic polar solvent, and 0-50 % by weight of ultra-pure water. |
申请公布号 |
KR20140024625(A) |
申请公布日期 |
2014.03.03 |
申请号 |
KR20120090835 |
申请日期 |
2012.08.20 |
申请人 |
DONGJIN SEMICHEM CO., LTD. |
发明人 |
HUH, SOON BEOM;KIM, BYUNG UK;CHO, TAE PYO;YOON, SUK IL;JUNG, SE HWAN;JANG, DOO YOUNG;PARK, SUN JOO |
分类号 |
G03F7/34;G03F7/32 |
主分类号 |
G03F7/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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