发明名称 COMPOSITION FOR REMOVING PHOTORESIST
摘要 The present invention relates to a stripping liquid composition for removing photoresist, capable of replacing solvents such as NMP which is hazardous to human body, and which is excellent in stripping, thereby including N,N-dimethyl propionamide. The stripping liquid composition for removing photoresist includes: 10-85 % by weight of N,N-dimethyl propionamide, 1-30 % by weight of cyclic amines, 10-85 % by weight of amphiprotic polar solvent, and 0-50 % by weight of ultra-pure water.
申请公布号 KR20140024625(A) 申请公布日期 2014.03.03
申请号 KR20120090835 申请日期 2012.08.20
申请人 DONGJIN SEMICHEM CO., LTD. 发明人 HUH, SOON BEOM;KIM, BYUNG UK;CHO, TAE PYO;YOON, SUK IL;JUNG, SE HWAN;JANG, DOO YOUNG;PARK, SUN JOO
分类号 G03F7/34;G03F7/32 主分类号 G03F7/34
代理机构 代理人
主权项
地址