微蚀印投影曝光设备的光学系统,申请号TW095117201-传众专利搜索

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发明名称	微蚀印投影曝光设备的光学系统
摘要
申请公布号	TWI428701	申请公布日期	2014.03.01
申请号	TW095117201	申请日期	2006.05.16
申请人	卡尔蔡司ＳＭＴ有限公司德国	发明人	奥雷里安　多朵克;亚尔布雷西特　艾尔曼;莎夏　布莱迪斯特
分类号	G03F7/20;G03F7/24;G02B27/18	主分类号	G03F7/20
代理机构		代理人	李宗德台北市大安区敦化南路2段218号5楼A区
主权项
地址	德国

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