半导体装置之制造方法及电浆化学气相沉积处理方法,申请号TW097130369-传众专利搜索

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发明名称	半导体装置之制造方法及电浆化学气相沉积处理方法
摘要
申请公布号	TWI428980	申请公布日期	2014.03.01
申请号	TW097130369	申请日期	2008.08.08
申请人	东京威力科创股份有限公司日本;国立大学法人东北大学日本	发明人	上田博一;野泽俊久;松冈孝明;寺本章伸;大见忠弘
分类号	H01L21/3065;H01L21/31	主分类号	H01L21/3065
代理机构		代理人	陈长文台北市松山区敦化北路201号7楼
主权项
地址	日本

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