发明名称 Järjestely termisessä prosessissa ja menetelmä likakerroksen paksuuden mittaamiseksi
摘要 An arrangement of a thermal device and a surface reflecting and/or scattering electromagnetic radiation in the inner part of the thermal device. A source of electromagnetic radiation is arranged at a first distance (L1) from the surface, and a detector of electromagnetic radiation is arranged at a second distance (L2) from the surface. The source is configured to emit radiation to the surface, which is reflected and/or scattered from the surface as reflected radiation. The detector receives reflected radiation; and the processing unit determines data dependent on the first and/or second distance by the emitted and reflected radiation. A wall of the thermal device has a window or aperture for emitting an optical signal from the light source to the surface. An electromagnetic distance measurement device measures the thickness or the increase in the thickness of a contamination layer from a thermal device.
申请公布号 FI124057(B) 申请公布日期 2014.02.28
申请号 FI20120006270 申请日期 2012.12.05
申请人 METSO POWER OY 发明人 MAUNULA, JONI
分类号 G01B11/06;F23G5/50;F23J3/00;F28G15/00;G01B11/14;G01C3/00;G01N21/94;G01S17/08 主分类号 G01B11/06
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