发明名称 EDGE TRIMMING METHOD FOR SEMICONDUCTOR WAFER AND SEMICONDUCTOR WAFER HAVING TRIMMED EDGE
摘要 An edge trimming method includes providing a semiconductor wafer having a front side and a backside, trimming an edge of a periphery of the semiconductor wafer from the front side to form at least a notch region around the periphery of the front side of the semiconductor wafer, and providing the front side of the semiconductor wafer to a handle wafer. The notch region comprises a first wall and a second wall, and the first and the second wall are perpendicular to each other.
申请公布号 US2014054748(A1) 申请公布日期 2014.02.27
申请号 US201213590196 申请日期 2012.08.21
申请人 LIU GENMAO 发明人 LIU GENMAO
分类号 H01L29/02;H01L21/762 主分类号 H01L29/02
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