发明名称 PLASMA PROCESSING APPARATUS
摘要 <p>In a vacuum arc discharge deposition apparatus, an orifice plate having an opening is arranged in a state of being insulated from a magnetic field duct including at least one curved portion for transporting a deposition particle in the middle of the at least one curved portion, in which a neutral particle and a charged particle are removed by applying a voltage to the orifice plate.</p>
申请公布号 WO2014030725(A1) 申请公布日期 2014.02.27
申请号 WO2013JP72489 申请日期 2013.08.16
申请人 CANON KABUSHIKI KAISHA 发明人 TAMAYA, SHUNSUKE
分类号 H01J37/32;C23C14/48 主分类号 H01J37/32
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