PROBLEM TO BE SOLVED: To provide an exposure apparatus which allows miniaturization of a substrate holding member and performs multi-area exposure of a large-sized substrate without any trouble.SOLUTION: A liquid crystal exposure apparatus 10 exposes a substrate P to illumination light IL through a mask M to transfer a pattern formed on the mask M to each of a plurality of areas on the substrate P. The exposure apparatus 10 includes: a mask holder 14 for holding the mask M; a substrate holder 30 for holding a part of the substrate P in parallel to a horizontal plane; a beam scanning device for scanning the substrate P in one axial direction (X-axis direction) in the horizontal plane with the illumination light IL through the mask M; and a substrate X step feed device 76 for driving the substrate P relative to the substrate holder 30 in at least one of three degree-of-freedom directions in the horizontal plane.
